| Product name | Silicon Ring |
|---|---|
| Product explanation | The role for gathering the plasma on the right place evenly |
| Application field | Etcher |
| Product type | Focus Ring, Insert Ring, Hor Edge Ring, Outer Ring, Ground Ring 등 |
| Raw material | Single Crystal Silicon, Poly Si, CVD SiC |
| Outer diameter | Ø600 Max |
| Resistance | Low resistance<0.1ohm.cm General resistance 1~20ohm.cm |
| Electrode hole | Diameter(Diameter) Roundness(Roundness) Concentricity(Concentricity) |
| Surface treatment | Polishing, Lappping, Grinding |
| Flatness | 0.01 |
| Machining accuracy | 0.05 |
- The half-finished product, the silicon cathode and ring, which is used for the semiconductor wafer
- Sales of the raw materials that are used for the semiconductor etching process
- Using it necessarily for manufacturing the 8” 12” large caliber wafer
- The main customers are semiconductor manufacturing companies such as Hana materials Co., Ltd. , SKC solmics Co., Ltd., and Worldex Industry & Trading Co., Ltd.
- The semiconductor manufacturing company
The silicon cathode is equipped at the top of the process chamber of the etcher. It also plays a role in spraying the electrode and reactivity gas (CF4, C4F6, O2) evenly. The silicon ring is equipped at the bottom of the process chamber of the etcher.
It plays a role in focusing the plasma ion caused by reactivity gas + RF.
